Low GDD Mirror, Ytterbium Laser, 45° AOI, 25.4 mm, 505-530 nm

The 10QM20UF.F55 is a low GDD Ytterbium Laser Mirror optimized for 505-530 nm. Made out of fused silica, the mirror size is 25.4 mm in diameter and 6.35 mm thick. This ultrafast mirror is ideal as a high reflectance steering mirror for Ytterbium lasers at 45° angle of incidence. Careful thin film design and advanced coating processes result in a mirror with maximum reflectivity with minimum effect on pulse dispersion.

Specifications

Technical Specs

Wavelength Region
VIS
Wavelength Range
505-530 nm
Mirror Shape
Round
Diameter
25.4 mm
Material
UV Grade Fused Silica
Coating Type
Laser Line Ultrafast Dielectric
Coating Code
UF.F55
Reflectivity
R_p, R_s > 99.5% @ 505-530 nm
Surface Quality
10-5 scratch-dig
Surface Flatness
λ/10 at 632.8 nm
Wedge
≤ 3 arc min
Angle of Incidence
45°

Clear Aperture
≥central 80% of diameter
Back Surface
Commercial Polished
Thickness
6.35 mm
Thickness Tolerance
±0.5 mm
Diameter Tolerance
+0/-0.25 mm
Chamfers
0.25–0.75 mm face width
Chamfers Angle Tolerance
45° ±15°
Cleaning
See How to Clean Optics
Damage Threshold
2 J/cm² @ 532 nm, 10 ns, 10 Hz

Wavelength Region
VIS
Wavelength Range
505-530 nm
Mirror Shape
Round
Diameter
25.4 mm
Material
UV Grade Fused Silica
Coating Type
Laser Line Ultrafast Dielectric
Coating Code
UF.F55
Reflectivity
R_p, R_s > 99.5% @ 505-530 nm
Surface Quality
10-5 scratch-dig
Surface Flatness
λ/10 at 632.8 nm
Wedge
≤ 3 arc min
Angle of Incidence
45°

Clear Aperture
≥central 80% of diameter
Back Surface
Commercial Polished
Thickness
6.35 mm
Thickness Tolerance
±0.5 mm
Diameter Tolerance
+0/-0.25 mm
Chamfers
0.25–0.75 mm face width
Chamfers Angle Tolerance
45° ±15°
Cleaning
See How to Clean Optics
Damage Threshold
2 J/cm² @ 532 nm, 10 ns, 10 Hz

Resources & Downloads

3D Product Models

Download CAD Files

Other

10QM20UF.F55 RoHS Certificate(265.9 kB, PDF)
10QM20UF.F55_ROHS2-2021.pdf(282.1 kB, PDF)
UF.F55 Raw Data.xlsx(49.4 kB, XLSX)

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